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Intel Leverages ASML's High NA EUV Technology To Produce 18A Panther Lake Chips
Intel has successfully implemented ASML's High Numerical Aperture Extreme Ultraviolet (EUV) lithography tool at its Oregon facility, leading to the first commercial production of Panther Lake chips using the 18A process node. This milestone establishes Intel as the first company to achieve volume production with High NA EUV technology, significantly advancing its manufacturing capabilities. The integration of this technology will enhance the production of smaller transistors, thereby supporting the demands of AI and other high-performance applications.
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Published 15 Jul 2026, 10:20 UTC3 min read
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Summary
TL;DR
- Installation of ASML's first High NA EUV lithography tool completed at Intel.
- Intel becomes the first to enter High NA EUV volume production.
- Focus on producing Panther Lake chips with 18A process technology.
- Technology expected to improve chip performance and density.
- Close collaboration between Intel and ASML to enhance semiconductor manufacturing.
Interesting facts
- High NA EUV lithography is essential for precise patterning at advanced nodes.
- Competitor TSMC plans to adopt High NA EUV technology around 2029.
- ASML's High NA EUV tool weighs 165 tons and represents the first of its kind commercially available.