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DigiTimes
Samsung holds off on High-NA EUV until 1nm production
Samsung Electronics has announced a delay in the mass production of High-NA EUV lithography technology, now projected for the 1nm-class node by approximately 2030. This postponement follows an earlier expectation for rollout at the 2nm and 1.4nm nodes, highlighting the complexities of advancing semiconductor manufacturing technology at extreme nodes. As the semiconductor industry strives for smaller geometries, this caution underscores the manufacturing challenges and development timelines faced by leading firms.
MonitorConfidence: HighLong term horizon
Published 21 Aug 2026, 00:20 UTC1 min read
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Summary
TL;DR
- Samsung postpones High-NA EUV lithography mass production.
- New production timeline targets the 1nm-class generation.
- Initial plans aimed for introduction at 2nm and 1.4nm nodes.
- Delay extends expectations to around 2030.
- Signifies complexities in advanced semiconductor technology development.
Interesting facts
- High-NA EUV lithography is critical for achieving advanced technology nodes.
- Samsung's delay reflects industry-wide challenges in semiconductor manufacturing.
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