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DigiTimes
Samsung delays High-NA EUV adoption until 1nm production in 2030
Samsung Electronics has revealed plans to delay the adoption of high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography technology, pushing mass production for its 1nm chip plans to the year 2030. This decision comes amidst evolving market expectations and a potential shift in memory supply dynamics that may peak or even turn to excess by 2028 due to chipmakers ramping up production. The implications of this delay might significantly affect the semiconductor supply chain and competition dynamics, particularly with the increasing push towards advanced manufacturing technologies.
MonitorConfidence: MediumMid term horizon
Published 13 Aug 2026, 08:20 UTC1 min read
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Summary
TL;DR
- High-NA EUV technology adoption postponed to 2030.
- 1nm node production plans affected by the delay.
- Market analysts predict a possible memory chip glut by 2028.
- Shift in supply dynamics as chipmakers increase production capacity.
- Impact on semiconductor competition anticipated.
Interesting facts
- This delay reflects the ongoing challenges in semiconductor manufacturing advancements.
- High-NA EUV is critical for producing smaller, more efficient chips.
- Samsung's decision may influence competitor strategies in the semiconductor industry.